Whether you are designing a battery for a new automotive EV design, industrial or consumer electronics, or any innovative battery product in this rapidly accelerating space, you have the same engineering goals: Performance, Lifespan, and Safety. The charge and discharge cycles of lithium-ion...

Battery formation is a pivotal stage in the manufacture of batteries, determining their performance and longevity. This process involves the initial electrochemical transformation of raw materials, shaping the battery's efficiency and stability. Through controlled charge and discharge cycles, the...

Successful Orthodontic Treatment Starts with Digital Occlusion Orthodontic treatment is now more accessible than ever with Invisalign, Six Month Smiles and braces for adults. While most patients seek ortho for cosmetic reasons, it is important for you to maintain a healthy occlusion so these...

T-Scan™ Reveals Occlusal Contacts and Extreme Forces in Veneer Cases Whether using composite or porcelain, veneer artistry is critical to the function and form of a patient's bite. T-Scan™ allows dentists to see timing and levels of force across the dentition. This helps reduce fracture potential...

Achieve Optimal Occlusal Loading with T-Scan™ Research studies show that 54% of patients experience prosthetic complications1. Although implant dentistry is the best option for most patients improper loading of these implants and crowns can lead to a number of prosthetic and surgical complications...

T-Scan™ Data Provides Context to Bite Discrepancies in Full Mouth Restoration Cases Among the most complex procedures in dentistry, full mouth reconstructions require a treatment plan that revolves around teeth, periodontal tissues, temporomandibular joints and muscles, and esthetics. T-Scan™ is a...

Wafer Polishing Pressure Measurement Wafer or Chemical Mechanical Polishing (CMP) requires that an even surface is achieved or subsequent manufacturing steps will be adversely affected, costing your company money. The I-Scan™ pressure mapping system provides instantaneous insight into the pressures...

Semiconductor Clamping Pressure Distribution Challenge Unknown clamping forces during computer chip and heat sink mounting or wafer probe testing can cause considerable product defects and quality issues. This can lead to lower yields and increased costs and product waste. Solution The I-Scan™ force...

Evaluate Brush-to-Wafer Contact Pressure Polyvinyl alcohol (PVA) brushes are used in the semiconductor process during the post-CMP cleaning stage. Different PVA brush designs can affect wafer cleaning efficiency. Ensuring proper brush-to-wafer contact pressure and contact area is crucial in...

Pressure Mapping For Magnetorheological Finishing Of Precision Optical Surfaces Challenge Conventional polishing typically involves abrasives and backing materials that result in minute cracks in the glass surface that translate into impairment of theoretical optical performance. Magnetorheological...