Whether you are designing a battery for a new automotive EV design, industrial or consumer electronics, or any innovative battery product in this rapidly accelerating space, you have the same engineering goals: Performance, Lifespan, and Safety. The charge and discharge cycles of lithium-ion...

Battery formation is a pivotal stage in the manufacture of batteries, determining their performance and longevity. This process involves the initial electrochemical transformation of raw materials, shaping the battery's efficiency and stability. Through controlled charge and discharge cycles, the...

Achieve Optimal Occlusal Loading with T-Scan™ Research studies show that 54% of patients experience prosthetic complications1. Although implant dentistry is the best option for most patients improper loading of these implants and crowns can lead to a number of prosthetic and surgical complications...

T-Scan™ Helps Dentists Achieve Denture Stability, Retention, and Fit When a patient is being fitted for dentures, analyzing occlusal forces becomes necessary for successful treatment outcomes. T-Scan™ provides dentists with digital bite force data that shows when and how teeth come into contact...

T-Scan™ Helps Create a Harmonized Occlusion Scheme to Preserve Crowns and Bridges Fitting crowns and bridges requires skill and precision to ensure a balanced, functional, and aesthetically pleasing bite. T-Scan™ provides dentists with digital bite force data, helping to analyze the occlusion of a...

Wafer Polishing Pressure Measurement Wafer or Chemical Mechanical Polishing (CMP) requires that an even surface is achieved or subsequent manufacturing steps will be adversely affected, costing your company money. The I-Scan™ pressure mapping system provides instantaneous insight into the pressures...

Semiconductor Clamping Pressure Distribution Challenge Unknown clamping forces during computer chip and heat sink mounting or wafer probe testing can cause considerable product defects and quality issues. This can lead to lower yields and increased costs and product waste. Solution The I-Scan™ force...

Evaluate Brush-to-Wafer Contact Pressure Polyvinyl alcohol (PVA) brushes are used in the semiconductor process during the post-CMP cleaning stage. Different PVA brush designs can affect wafer cleaning efficiency. Ensuring proper brush-to-wafer contact pressure and contact area is crucial in...

Pressure Mapping For Magnetorheological Finishing Of Precision Optical Surfaces Challenge Conventional polishing typically involves abrasives and backing materials that result in minute cracks in the glass surface that translate into impairment of theoretical optical performance. Magnetorheological...

Evaluate Heat Sink Contact Pressure Background High density, active, electronics emit energy that can raise their temperature leading to failures. Heat sinks are secured to components to dissipate their heat. Challenge For the heat sink to function properly, even contact must be achieved between the...