Sensor Model / Map: 6010N

6010N

Overall	Overall	Tab	Matrix	Matrix	Columns			Rows			Total	Resolution
Length	Width	Length	Width	Height		Pitch			Pitch		No. of
L	W	A	MW	MH	CW	CS	Qty.	RW	RS	Qty.	Sensels	Sensel Density
(in.)	(in.)	(in.)	(in.)	(in.)	(in.)	(in.)		(in.)	(in.)			(sensel per in.²)
22.40	17.44	4.96	14.20	14.20	0.098	0.161	88	0.098	0.161	88	7744	38.4
(mm)	(mm)	(mm)	(mm)	(mm)	(mm)	(mm)		(mm)	(mm)			(sensel per cm²)
569.0	443.0	126.0	360.7	360.7	2.5	4.1	88	2.5	4.1	88	7744	5.9

Pressure Ranges

psi	7	29
kPa	48	200

Requirements

Dual Handles or Two VersaTek Handles

Features

Works with wafers up to 12 diameter

Applications

Wafer polishing machine set-up
CMP

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